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濺鍍用靶材、沉澱材料市場

Sputtering Targets & Evaporation Materials Market

出版商 IndustryARC 商品編碼 978849
出版日期 內容資訊 英文 217 Pages
商品交期: 2-3個工作天內
價格
濺鍍用靶材、沉澱材料市場 Sputtering Targets & Evaporation Materials Market
出版日期: 2020年10月01日內容資訊: 英文 217 Pages
簡介

全球濺鍍用靶材、沉澱材料市場的收益從2020年的30億3,600萬美元,到2025年達到34億美元,預計2020年∼2025年以2.2%的年複合成長率成長。

本報告提供全球濺鍍用靶材、沉澱材料市場相關調查分析,市場概要,市場規模、預測,各市場區隔的市場分析,各地區的市場分析,競爭情形等相關的系統性資訊。

目錄

第1章 全球濺鍍用靶材、沉澱材料市場:市場概要

  • 定義和範圍

第2章 全球濺鍍用靶材、沉澱材料市場:摘要整理

第3章 全球濺鍍用靶材、沉澱材料市場:形勢

  • 比較分析
    • 市場佔有率分析:主要企業
    • 產品基準:主要企業
    • 前五名公司的財務分析
    • 專利分析:主要企業
    • 價格分析

第4章 全球濺鍍用靶材、沉澱材料市場:市場動態

  • 推動市場要素
  • 阻礙市場要素
  • 市場機會
  • 波特的五力分析

第5章 全球濺鍍用靶材、沉澱材料市場:策略性分析

  • 價值鏈分析
  • 機會分析
  • 市場生命週期
  • 供應商分析與分銷商分析

第6章 濺鍍用靶材、沉澱材料市場:各類型

  • 濺鍍用靶材
  • 沉澱材料

第7章 濺鍍用靶材、沉澱材料市場:各濺鍍法

  • DC濺鍍
  • 反應性濺鍍
  • RF濺鍍
  • 離子協助濺鍍
  • 磁控管濺鍍
  • 氣體流動濺鍍
  • 其他

第8章 濺鍍用靶材、沉澱材料市場:各零件

  • 真空幫浦
  • 真空計
  • 製程氣體監測器
  • 漏洩檢驗器
  • 薄膜檢測/沉澱控制器
  • 光學流程監測器
  • 真空閥門
  • 超高真空的零件
  • 搬送機器人
  • 其他

第9章 濺鍍用靶材、沉澱材料市場:各沉澱法

  • 熱沉澱
  • 電子束沉澱
  • 真空蒸發
  • 反應性沉澱
  • 其他

第10章 濺鍍用靶材、沉澱材料市場:各材料類型

  • 純金屬
  • 同位素
  • 合金
  • 化合物
  • 其他

第11章 濺鍍用靶材、沉澱材料市場:各濺鍍用靶材

  • 金屬、元素濺鍍用靶材
  • 氧化物濺鍍用靶材
  • 合金濺鍍用靶材
  • 複合濺鍍用靶材
  • 其他

第12章 濺鍍用靶材、沉澱材料市場:各用途

  • 航太、防衛
  • 牙科
  • 美術品的材料
  • 農業
  • 電子產品
  • 工業
  • 能源
  • 光學
  • 其他

第13章 濺鍍用靶材、沉澱材料市場:各地區

  • 北美
    • 美國
    • 加拿大
    • 墨西哥
  • 歐洲、中東、非洲
    • 歐洲
    • 中東
    • 非洲
  • 亞太地區
    • 中國
    • 日本
    • 韓國
    • 印度
    • 澳洲、紐西蘭
    • 馬來西亞
    • 台灣
    • 其他的亞太地區

第14章 濺鍍用靶材、沉澱材料市場:熵

第15章 市場佔有率分析

第16章 濺鍍用靶材、沉澱材料市場企業分析

  • 市場佔有率,企業收益,產品,M&A,開發
  • JX Nippon
  • Plansee SE
  • Tosoh Corporation
  • Umicore Thin Film Products AG
  • Hitachi Metals Ltd
  • KFMI
  • Soleras Advanced Coatings
  • ULVAC Inc.
  • Materion Corporation等
目錄
Product Code: CMR 0020

Considerable Global Sputtering Targets & Evaporation Materials Market growth is expected to increase in the coming years, due to constant demand from dedicated end user sectors, especially electronics, energy, industrial, optical and others. The Sputtering Targets & Evaporation Materials Market revenue analysis for the year 2020 has been estimated to be $3036 million and for the period of 2020 until 2025 the global sputtering targets and evaporation materials market is estimated to grow at a CAGR of 2.2% to reach $3.4 billion.

APAC region is the major Sputtering Targets & Evaporation Materials Market shareholder with more than 45% share in the global market. This is due to the presence of numerous targets and materials providers and end user sectors. In the Global Sputtering Targets & Evaporation Materials Market share, North America held the second major share followed by Europe and RoW. The Sputtering Targets and Evaporation Materials market survey states, in the coming years the marketplace will grow quickly, owing to their significant applications in diverse end user industries which include chemical manufacturing, optics, aerospace and defense and many more. Overall, the sputtering targets & evaporation materials market will find steady demand from dedicated end used industries for the forecast period of 2020-2025.

What are Sputtering Targets & Evaporation Materials?

Sputtering targets and evaporation materials (ST&EM) are target materials which are used to deposit thin films or layer of a solid target material on desired substrate by employing various methods. The thin film deposition can be achieved through two methods: physical vapor deposition (PVD) processes or Chemical vapor Deposition (CVD) is used for various commercial and scientific purposes. Sputtering targets are available in the form of customized alloys and as ceramic sputtering targets with individual chemistry or as precious metals and non-precious metals sputtering targets. The manufacturing process of precious metal reclamation materials is used to fabricate the sputtering target can be critical to achieve the desired characteristics in a sputtered thin films.

What are the major applications for Sputtering Targets & Evaporation Materials?

Sputtering targets and evaporation material coatings are applied across a wide range of materials in semiconductor components, displays, sensors, data storage devices, photovoltaic cells, batteries, industrial tools, optics, automobile mirrors, decorative and many more for enhancing the properties of metal targets as well as semiconducting or insulating targets. Pulsed-DC and RF magnetron sputtering allows bombarding of materials with poor electrical conductivity (mainly ceramics) for insulating properties. On the other hand semiconductor materials with better electrical conductivity are sputtered with the help of pulsed-DC power supplies for modifying conductive properties of materials.

Market Research and Market Trends of Sputtering Targets & Evaporation Materials Ecosystem

Applications, such as microscopy, imaging, or interferometry, industries ranging from the life sciences to testing and measurement integrate precision optical components to alter the state of light through a variety of means which include focusing, filtering, reflecting, or polarizing. Sputtering targets guarantee high quality optical coatings in all plasma assisted reactive magnetron sputtering processes. Ultrafine grain structure and purities of up to 6N ensure reproducibility throughout production process. Infrared (IR) applications requiring optical coatings are used by a broad range of industries - ranging from commercial, aerospace, military to medical. By increasing transmission, enhancing contrast, and eliminating ghost images the Anti-reflection (AR) coatings improve the efficiency of the optic. AR and IR applications are expected to grow as research in the above sectors has always demanded for materials with precise properties.

It is neither economically feasible nor practical to manufacture 100% pure materials hence all sputter targets and evaporation sources contain impurities. Many targets and sources are shipped with a certificate of analysis listing only a handful of elements that are tested. The true value of the overall impurity concentration hence remains unknown. This occurs because they are extremely difficult to separate from the main constituent, or because for many applications they are not regarded as chemically distinct. An example is the Hafnium content in Titanium materials. For many semiconductor applications extremely tight purity specifications are required. Even small amounts of trace elements can dramatically affect device performance. Hence sputtering targets manufacturers need to further focus on research for manufacturing purest materials.

Long life targets with utilization nearly 100% and with longevity almost twice of normal planar targets are being preferred for industrial applications in the area of greatest wear and decreased volumes in areas where little or no deposition takes place. Unique enhanced design sputtering targets are produced by Plasmaterials, Inc. for increasing target utilization. The enhanced profile provides greater utilization factors through engineering design than those found in planar designed targets. The inverse of the erosion profile is observed for increasing the target thickness in those areas. This unique capability is available for use in the sputtering of precious metals and magnetic materials and it is featured in both planar and rotary designed cathode assemblies of Plasmaterials.

GRIKIN Advanced Materials Co., Ltd. manufactures high-purity metal sputtering target material in China. Its operation concept "entrepreneurship, innovation, development and dedication" has been providing stable and rapid development and has become the leading enterprise with significant influence in the industry. GRIKIN has emphasis on research, development, manufacture and sales of advanced film materials for electronics and photoelectron, advanced materials for biologically medical treatment mainly, as well as precious metals and products, and carries out information consulting services, technical services and hedging services with respect to rare and precious metal materials. GRIKIN has been undertaken about a hundred of national and provincial scientific and technological development projects.

Who are the Major Players in Sputtering Targets & Evaporation Materials market?

The players profiled in the report include Heraeus Holding, Umicore Thin Film Products, Hitachi Metals, KAMIS Inc., The Kurt J.Leskar Company, Materion Corporation, Nichia Corporation, China Rare Metal Material Co Ltd, Grikin Advanced Materials Co Ltd, Canon Optron Inc, and Process Materials, Aida Chemical Industries Co Ltd.

What is our report scope?

The report incorporates in-depth assessment of the competitive landscape, product market sizing, product benchmarking, market trends, product developments, financial analysis, strategic analysis and so on to gauge the impact forces and potential opportunities of the market. Apart from this the report also includes a study of major developments in the market such as product launches, agreements, acquisitions, collaborations, mergers and so on to comprehend the prevailing market dynamics at present and its impact during the forecast period 2020-2025.

Key Takeaways from this Report:

Evaluate market potential through analyzing growth rates (CAGR %), Volume (Units) and Value ($M) data given at country level - for product types, end use applications and by different industry verticals.

Understand the different dynamics influencing the market - key driving factors, challenges and hidden opportunities.

Get in-depth insights on your competitor performance - market shares, strategies, financial benchmarking, product benchmarking, SWOT and more.

Analyze the sales and distribution channels across key geographies to improve top-line revenues.

Understand the industry supply chain with a deep-dive on the value augmentation at each step, in order to optimize value and bring efficiencies in your processes.

Get a quick outlook on the market entropy - M&A's, deals, partnerships, product launches of all key players for the past 4 years.

Evaluate the supply-demand gaps, import-export statistics and regulatory landscape for more than top 20 countries globally for the market.

Table of Contents

1. Sputtering Targets and Evaporation Materials Market- Market Overview

  • 1.1 Definitions and Scope

2. Sputtering Targets and Evaporation Materials Market- Executive Summary

  • 2.1 Market Revenue, Market Size and Key Trends by Company
  • 2.2 Key Trends by Type
  • 2.3 Key Trend by Sputtering Method
  • 2.4 Key Trends by Components
  • 2.5 Key Trends by Evaporation Method
  • 2.6 Key Trends by Material Type
  • 2.7 Key Trends by Sputtering Targets
  • 2.8 Key Trends by Application
  • 2.9 Key Trends by Geography

3. Sputtering Targets and Evaporation Materials Market- Landscape

  • 3.1 Comparative analysis
    • 3.1.1 Market Share Analysis- Top Companies
    • 3.1.2 Product Benchmarking- Top Companies
    • 3.1.3 Top 5 Financials Analysis
    • 3.1.4 Patent Analysis- Top Companies
    • 3.1.5 Pricing Analysis

4. Sputtering Targets and Evaporation Materials Market- Market Forces

  • 4.1 Market Drivers
  • 4.2 Market Constraints
  • 4.3 Market Opportunities
  • 4.4 Porters five force model
    • 4.4.1 Bargaining power of suppliers
    • 4.4.2 Bargaining powers of customers
    • 4.4.3 Threat of new entrants
    • 4.4.4 Rivalry among existing players
    • 4.4.5 Threat of substitutes

5. Sputtering Targets and Evaporation Materials Market -Strategic analysis

  • 5.1 Value chain analysis
  • 5.2 Opportunities analysis
  • 5.3 Market life cycle
  • 5.4 Suppliers and distributors Analysis

6. Sputtering Targets and Evaporation Materials Market- By Type (Market Size -$Million)

  • 6.1 Sputtering Targets
  • 6.2 Evaporation Materials

7. Sputtering Targets and Evaporation Materials Market- By Sputtering Method (Market Size -$Million)

  • 7.1 DC Sputtering
  • 7.2 Reactive Sputtering
  • 7.3 RF Sputtering
  • 7.4 Ion Assisted Sputtering
  • 7.5 Magnetron Sputtering
  • 7.6 Gas Flow Sputtering
  • 7.7 Others

8. Sputtering Targets and Evaporation Materials Market- By Components (Market Size -$Million)

  • 8.1 Vacuum Pump
    • 8.1.1 Dry Pump
    • 8.1.2 Oil Rotary Pump
    • 8.1.3 Mechanical Booster Pump
    • 8.1.4 Ion Pump
    • 8.1.5 Turbo Molecular Pump
    • 8.1.6 Oil Diffusion Pump
    • 8.1.7 Others
  • 8.2 Vacuum Gauge
  • 8.3 Process Gas Monitor
  • 8.4 Leak Detector
  • 8.5 Thin Film Measurement/Deposition Controller
    • 8.5.1 Spectroscopic Ellipsometer
    • 8.5.2 Film Thickness Measurement
    • 8.5.3 Deposition Controller
  • 8.6 Optical Process Monitor
  • 8.7 Vacuum Valve
  • 8.8 Parts of Ultra-High-Vacuum
  • 8.9 Transfer Robot
  • 8.10 Others

9. Sputtering Targets and Evaporation Materials Market- By Evaporation Method (Market Size - $Million)

  • 9.1 Thermal Evaporation
  • 9.2 Electron-beam Evaporation
  • 9.3 Vacuum Evaporation
  • 9.4 Reactive Evaporation
  • 9.5 Others

10. Sputtering Targets and Evaporation Materials Market- By Material Type (Market Size - $Million)

  • 10.1 Pure Metals
    • 10.1.1 Precious Metals
    • 10.1.2 Non-Precious Metals
  • 10.2 Isotope
  • 10.3 Alloys
  • 10.4 Compounds
    • 10.4.1 Oxides
    • 10.4.2 Nitrides
    • 10.4.3 Sulphides
    • 10.4.4 Carbides
    • 10.4.5 Others
  • 10.5 Others

11. Sputtering Targets and Evaporation Materials Market- By Sputtering Targets (Market Size - $Million)

  • 11.1 Metallic & Elemental Sputtering Targets
  • 11.2 Oxide Sputtering Targets
  • 11.3 Alloy Sputtering Targets
  • 11.4 Compound Sputtering Targets
  • 11.5 Others

12. Sputtering Targets and Evaporation Materials Market- By Application (Market Size - $Million)

  • 12.1 Aerospace & Defense
  • 12.2 Dentistry
  • 12.3 Fine Art Materials
  • 12.4 Agriculture
  • 12.5 Electronics
    • 12.5.1 Magnetic Data Storage
    • 12.5.2 Displays
    • 12.5.3 Semiconductor
    • 12.5.4 Sensors
  • 12.6 Industrial
    • 12.6.1 Automotive
    • 12.6.2 Wear Resistant
    • 12.6.3 Corrosion Resistant
    • 12.6.4 Heat Resistant
    • 12.6.5 Chemical Manufacturing
  • 12.7 Energy
    • 12.7.1 Photovoltaic Cell
    • 12.7.2 Fuel Cells
    • 12.7.3 Solar Thermal Collectors
    • 12.7.4 Batteries
  • 12.8 Optics
    • 12.8.1 Microscopes
    • 12.8.2 Camera Lenses
    • 12.8.3 Automobile Mirrors
  • 12.9 Others

13. Sputtering Targets and Evaporation Materials Market - By Geography (Market Size - $Million)

  • 13.1 North America
    • 13.1.1 U.S.
    • 13.1.2 Canada
    • 13.1.3 Mexico
  • 13.2 EMEA
    • 13.2.1 Europe
      • 13.2.1.1 U.K
      • 13.2.1.2 Germany
      • 13.2.1.3 Italy
      • 13.2.1.4 France
      • 13.2.1.5 Denmark
      • 13.2.1.6 Spain
      • 13.2.1.7 Netherlands
      • 13.2.1.8 Belgium
      • 13.2.1.9 Rest of Europe
    • 13.2.2 Middle East
      • 13.2.2.1 Saudi Arabia
      • 13.2.2.2 UAE
      • 13.2.2.3 Israel
      • 13.2.2.4 Rest of Middle East
    • 13.2.3 Africa
      • 13.2.3.1 South Africa
      • 13.2.3.2 Nigeria
      • 13.2.3.3 Egypt
      • 13.2.3.4 Rest of Africa
  • 13.3 APAC
    • 13.3.1 China
    • 13.3.2 Japan
    • 13.3.3 South Korea
    • 13.3.4 India
    • 13.3.5 Australia & New Zealand
    • 13.3.6 Malaysia
    • 13.3.7 Taiwan
    • 13.3.8 Rest of APAC

14. Sputtering Targets and Evaporation Materials Market- Entropy

  • 14.1 New Product Launches
  • 14.2 M&A's, Collaborations, JVs and Partnerships

15. Market Share Analysis Premium

  • 15.1 Market Share by Country- Top companies
  • 15.2 Market Share by Region- Top companies
  • 15.3 Market Share by type of Product / Product category- Top companies
  • 15.4 Market Share at global level- Top companies
  • 15.5 Best Practices for companies

16. Sputtering Targets and Evaporation Materials Market Company Analysis

  • 16.1 Market Share, Company Revenue, Products, M&A, Developments
  • 16.2 JX Nippon
  • 16.3 Plansee SE
  • 16.4 Tosoh Corporation
  • 16.5 Umicore Thin Film Products AG
  • 16.6 Hitachi Metals Ltd
  • 16.7 KFMI
  • 16.8 Soleras Advanced Coatings
  • 16.9 ULVAC Inc.
  • 16.10 Materion Corporation
  • 16.11 Company 10 and more