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市場調查報告書
全球半導體微蝕刻技術的進步
Global Advances in Semiconductor Microlithography Technologies
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全球半導體微蝕刻技術的進步 是由出版商Technical Insights, Inc.在2007年06月所出版的。
這份英文市場調查報告書包含126 Pages 價格從美金6000起跳。
Abstract
This research service deals with the advances in next generation
microlithography technologies.
Table of Contents
1 EXECUTIVE SUMMARY
- Overview of Lithography Technology
- Lithography and its Role in Semiconductor Fabrication
- Highlights and Key Findings
- Scope and Methodology
- Scope of the Research Service
- Research Methodology
2 THE SEARCH FOR NEXT GENERATION LITHOGRAPHY
- Why is it Important?
- The Need to Support Technological Evolution
- Major Issues
- Analysis of the NGL Candidates
- Trends in NGL
- NGL Technologies - A Foresight
3 OPTICAL LITHOGRAPHY
- Overview and Current Status of Optical Lithography
- Optical Lithography--Overview
- Current Status of Development
- Immersion Lithography
- Immersion Lithography--Overview
- Immersion Lithography--Technology Challenges
- Extreme Ultraviolet Lithography (EUVL)
- EUVL--Overview
- Technology Benefits
- EUVL Research Groups
- EUVL--Technology Challenges
- 157 nm Lithography
- The End of 157 nm Lithography?
- Technology Challenges
- Key Technology Developments--I
- High-Power EUVL Source--Powerlase Limited--UK
- Effect of Resist Blurring on the Resolution of Arf Immersion
Lithography--Canon Inc.--Japan
- The Rise of Inverse Lithography Technology--Luminescent Technologies
Inc.--USA
- Special Routing Technique to Reduce Defect Density--TSMC--Taiwan
- 3D Lithography Technology for Nanostructures--Focal Point Microsystems
LLC--USA
- OPC Simulation to Minimize Cost of Mask Development--Mentor Graphics
Corporation--USA
- Industry Group to Introduce EUVL for 45 nm--EUVA--Japan
- First EUV Exposed Image--A Milestone in Microlithographic
Research--University at Albany--USA
- Advanced DFM Lithography Solution for 45 nm and below--Nikon Precision
Inc and Synopsys Inc--USA
- Extending the Limits of Photolithography--IBM Almaden Research
Center--USA
- Key Technology Developments--II
- The Merger of Computational and Wafer Lithography--Brion Technologies
Inc--USA
- Nanolithograhic Enhancement by Application of Nanoscale Ridge
Apertures--Purdue University--USA
- The Right Source for EUVL--Cymer Inc--USA
- Leading in Immersion and EUV Lithography--ASML--Netherlands
- X-Ray-Based Micro-/Nanomanufacturing--Singapore Synchrotron Light
Source--Singapore
- Interface Lithography--National Institute for Matter Physics--Italy
4 ELECTRON PROJECTION LITHOGRAPHY AND MASKLESS LITHOGRAPHY
- Introduction
- Maskless Lithography
- Electron Projection Lithography (EPL)
- Electron Proximity Projection Lithography
- Maskless Lithography
- Electron Beam Lithography
- O-ML2 and CP-ML2
- Ion Beam Lithography
- Mix and Match Strategy
- Electron Projection Lithography
- Current Status of EPL
- Technology Challenges and Potential Solutions
- Electron Proximity Projection Lithography
- Current Status of LEEPL
- Advantages and Challenges
- Key Technology Developments Related to this Sector
- A New Approach using Interference Lithography with Deep Reactive Ion
Etching-University of California--USA
- A New Way to Create Nanogaps--University of Pennsylvania--USA
- Variable-Pressure E-Beam Lithography--Northwestern University--USA
5 NANOIMPRINT LITHOGRAPHY
- Introduction and Technology Description
- Introduction
- NIL Technologies and Applications
- Key Adoption Factors
- NIL Technology Benefits
- Major Challenges
- Technical Requirements and Current Status of NIL
- Key Technology Developments Related to NIL Sector
- A New Holographic Contact Lithography Approach for Photonic
Crystals--National University of Singapore--Singapore
- Imprint Lithography--A Viable Alternative for NGL--Molecular
Imprints--USA
- Major Issue in NIL Resolved--Nanonex Corp and Princeton University--USA
- High-Precision Aligner Systems for NIL--EV Group--Austria
- Advanced NIL Technique for Research and Industrial Applications--Obducat
AB--Sweden
6 NGL--TECHNOLOGY FORESIGHT; FUNDING ANALYSIS
- Future Outlook--Analyst Insights
- Overview of NGL Technologies
- Future of Optical Lithography
- 157 nm Immersion Lithography for 32 nm?
- Direct-Write Lithography and Electron Projection Lithography
- Extreme Ultraviolet Lithography
- Nanoimprint Lithography
- Major Fundings and Grants
- DARPA and NIST Have Ceased Funding for US Maskless Lithography
- Four Texan Startups Receive AMRC Funding
- US Commerce Department Holds New Funding Competition for High-Risk
Industrial Research
- University of Albany' s NanoCollege and Vistec Lithography Receive
Funding from New York State Office
- Veeco Receives Further Funding from SEMATECH for EUVL Mask Tools
- Major Funding for El-Mul' s Nanotube E-Beam Field Emitter
- Multimillion Pound Funding Boost for Research at James Watt
Nanofabrication Centre
- Molecular Imprints Secures More Funding
7 KEY PATENTS AND CONTACT DETAILS
- Recent Patents
- List of Key Patents from Market Leaders
- Analysis of Patents from Emerging Companies in this Sector
- Contact Details
- Corporates
- Universities and Research Institutes
8 DECISION SUPPORT DATABASE
- Decision Support Database Tables
- Global OLED Market (2002-2012)
- Global LCD Sales (2002-2012)
- Consumer Electronics Contribution to Electronics Industry--2002 to 2012
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