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光罩的製造，檢驗，維修:市場分析與策略性課題
市場調查報告書
商品編碼
1266878

光罩的製造，檢驗，維修:市場分析與策略性課題

Mask Making, Inspection, and Repair: Market Analysis and Strategic Issues
出版日期: | 出版商: Information Network | 英文 | 商品交期: 2-3個工作天內

價格

本報告提供美國及全球半導體產業上光罩製造，檢驗，維修領域的相關調查，含括影響市場的策略性課題。同時彙整市場各地區趨勢與市場預測，市場佔有率等資訊。

目錄

第1章 簡介

第2章 摘要整理

第3章 技術問題

  • 光罩製造
    • 光罩坯料
    • 完成光罩
  • 光罩製造設備
    • 電子束系統
    • 雷射模式發電機
  • 光罩檢驗
    • 光罩缺陷
  • 光罩維修
    • 雷射維修
    • 聚焦離子束維修
    • 其他的維修方法

第4章 用戶-供應商策略

  • 用戶需求確立
  • 競爭供應商的機會

第5章 市場預測

  • 促進因素
    • 簡介
    • IC製程技術趨勢
    • 光罩和Reticle的必要條件
    • 快速周轉設備
    • 直接寫入電子束和X光的影響
  • 市場預測的前提條件
  • 光罩製造、檢驗、維修
    • 完成光罩
    • Reticle、光罩製造設備

Each new generation of IC devices brings about a corresponding decrease in linewidths and minimum feature sizes. The technological trends and innovations in IC fabrication processes directly influence the market for masks and mask making equipment. This report examines and projects the technologies involved, their likely developments, why and when their introduction or demise will take place, what problems and choices are facing users, and where the opportunities and pitfalls are.

This report addresses the strategic issues impacting the mask making, inspection, and repair sectors of the semiconductor industry in the U.S. and the world. The mask market is segmented by geographic region. The mask equipment markets are analyzed and projected and market shares presented.

Table of Contents

Chapter 1. Introduction

  • 1.1. The Need For This Report

Chapter 2. Executive Summary

  • 2.1. Summary of Major Issues
  • 2.2. Summary of Market Opportunities

Chapter 3. Technology Issues

  • 3.1. Mask Making
    • 3.1.1. Mask Blanks
    • 3.1.2. Completed Masks
  • 3.2. Mask Making Equipment
    • 3.2.1. Electron Beam Systems
    • 3.2.2. Laser Pattern Generators
  • 3.3. Mask Inspection
    • 3.3.1. Mask Defects
      • Transmission Variations
      • Transparent Defects
      • Nuisance Defects
      • CD Variations
      • Reflectivity Variations
  • 3.4. Mask Repair
    • 3.4.1. Laser Repair
    • 3.4.2. Focused Ion Beam Repair
    • 3.4.3. Other Repair Methods

Chapter 4. User - Vendor Strategies

  • 4.1. Establishing User Needs
    • 4.1.1. Mask Making - Merchant or Captive
    • 4.1.2. Submicron Mask Making Equipment - Laser vs E-Beam
    • 4.1.3. Mask Inspection Equipment
    • 4.1.4. Mask Repair - Laser vs FIB
    • 4.1.5. Phase-Shift Masks
    • 4.1.6. Optical Proximity Correction
    • 4.1.7. NGL Technology Challenges
      • 4.1.7.1. X-Ray Masks
      • 4.1.7.2. EPL Masks
      • 4.1.7.3. EUVL Masks
  • 4.2. Competitive Vendor Opportunities

Chapter 5. Market Forecast

  • 5.1. Driving Forces
    • 5.1.1. Introduction
    • 5.1.2. Trends in IC Processing Technology
    • 5.1.3. Mask and Reticle Requirements
    • 5.1.4. Fast Turnaround Devices
    • 5.1.5. Impact of Direct Write E-Beam and X-Ray
  • 5.2. Market Forecast Assumptions
  • 5.3. Mask Making, Inspection, and Repair
    • 5.3.1. Completed Mask Market
    • 5.3.2. Reticle/Mask Manufacturing Equipment

List of Figures

  • 3.1. Light Transmittance of Glasses
  • 3.2. Photomask Fabrication Flow
  • 3.3. Optical Photomask Fabrication Flow
  • 3.4. SCAPLEL Photomask Fabrication Flow
  • 3.5. MaskRigger Software in a Mask Fabrication Process
  • 3.6. Schematic of a Laser Pattern Generator
  • 3.7. Mulith Reference Distribution Aerial Image Formation
  • 3.8. Die-to-Die and Die-to-Database Inspection
  • 3.9. Defect Inspection Practices
  • 3.10. Percentage of Yield Losses
  • 3.11. Yield for Masks
  • 3.12. Yield for Binary Masks
  • 3.13. Schematic of a Focused Ion Beam System
  • 3.14. Illustration of Clear and Opaque Mask Repair
  • 4.1. Write Time Versus Device Complexity
  • 4.2. Subwavelength Gap
  • 4.3. Lithography Requiements
  • 4.4. Phase-Shifting Masks
  • 4.5. iN Phase Mask Design
  • 4.6. Illustration of OPC
  • 4.7. Main NGL Mask Formats
  • 4.8. Mask Costs Versus Feature Size
  • 5.1. Increasing Mask Complexity
  • 5.2. Production Costs for Maskmaking
  • 5.3. Capital Expenditures and Revenues
  • 5.4. Photomask Functionality
  • 5.5. Worldwide Merchant Mask Making Market Shares
  • 5.6. North American Merchant Mask Making Market Shares
  • 5.7. European Merchant Mask Making Market Shares
  • 5.8. Pacific Rim Merchant Mask Making Market Shares
  • 5.9. Japan Merchant Mask Making Market Shares
  • 5.10. Mask Inspection Market Shares
  • 5.11. Mask Metrology Market Shares
  • 5.12. Mask Repair Market Shares
  • 5-13. Photomask Repair Methods

List of Tables

  • 4.1. FIB and Laser Repair Comparison
  • 4.2. NGL Mask Formats
  • 4.3. Cost of Reticle/X-Ray Mask
  • 4.4. Phase Shift Mask and X-Ray Mask Manufacturing
  • 5.1. Roadmap of Mask Inspection
  • 5.2. IC Lithographic Requirements
  • 5.3. Increasing Mask Complexity
  • 5.4. Worldwide Mask Making Market by Feature Size
  • 5.5. Captive Mask Shops
  • 5.6. Worldwide Mask Making Equipment Market Forecast
  • 5.7. Mask Inspection Market Forecast
  • 5.8. Mask Metrology Market Forecast