100nm 以下 IC 生產用化學藥品與材料
Chemicals and Materials for Sub-0.100nm IC Manufacturing
|100nm 以下 IC 生產用化學藥品與材料 Chemicals and Materials for Sub-0.100nm IC Manufacturing|
|出版日期: 2017年01月01日||內容資訊: 英文||
Chemicals and materials are used in every processing step in the fabrication of silicon and gallium arsenide integrated circuits. Technological advances in Si and GaAs ICs have resulted in more stringent requirements in the purity and quality of processing chemicals and materials for cleaning, etching, and deposition. As linewidths decrease, the level and size of contaminants in both chemicals and the manufacturing cleanroom become increasingly important as it directly impacts device yield.
This report addresses a number of important factors that will impact the consumption of chemicals and materials for manufacturing ICs with feature sizes <100nm: Technological issues and trends; Purity and particulate requirements; Chemical dispensing practices; Acid reprocessing; Strategic considerations for chemical users; Analysis and forecast of the worldwide chemical market; and trends in usage as devices features decrease. Market shares of vendors also presented.