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市場調查報告書

光刻檢測設備的全球市場的預測:∼2021年

Analysis of Global Lithography Metrology Equipment Market, Forecast to 2021

出版商 Frost & Sullivan 商品編碼 545452
出版日期 內容資訊 英文 116 Pages
商品交期: 最快1-2個工作天內
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光刻檢測設備的全球市場的預測:∼2021年 Analysis of Global Lithography Metrology Equipment Market, Forecast to 2021
出版日期: 2017年07月24日 內容資訊: 英文 116 Pages
簡介

全球光刻檢測設備的收益規模在預測期間內預計以7.4%的年複合成長率發展,從2016年的9億5790萬美元,成長到2021年13億7010萬美元的規模。

本報告提供全球光刻檢測設備的市場調查,市場及產品定義和概要,市場成長的各種影響因素分析,競爭環境與市場佔有率,主要企業簡介,技術趨勢,各技術、地區的收益規模的變化與預測,未來展望等彙整資料。

第1章 摘要整理

第2章 市場概要

第3章 成長推動因素與阻礙

  • 市場促進因素
  • 成長推動因素的說明
  • 市場成長的阻礙因素
  • 阻礙成長要素的說明

第4章 收益預測

  • 市場工程評估
  • 預測的前提條件
  • 收益預測
  • 收益預測相關討論
  • 收益佔有率預測:各地區
  • 收益預測:各地區
  • 地區的熱點
  • 地區的熱點相關討論
  • 收益預測相關討論:各地區

第5章 市場佔有率、競爭分析

  • 市場佔有率
  • 市場佔有率分析
  • 競爭環境
  • 主要經營者:SWOT分析
  • 企業簡介:日立先端科技
  • 企業簡介:KLA-Tencor
  • 企業簡介:ASML
  • 競爭因素、評估

第6章 成長機會、推薦行動

  • 3大市場機會
  • 成長機會:IoT
  • 成長機會:設備的進步
  • 成長機會:先進流程控制
  • 成長、成長的策略性必要條件

第7章 技術趨勢

  • EPE (Edge Placement Error)
  • CD-AFM市場
  • 技術比較
  • 混合檢測:概要
  • Frost的展望:出租設備的經營模式

第8章 CD-SEM部門分析

  • 主要調查結果
  • 市場工程評估
  • 收益預測
  • 收益預測相關討論
  • 市場佔有率
  • 市場佔有率分析

第9章 OCD部門分析

  • 主要調查結果
  • 市場工程評估
  • 收益預測
  • 收益預測相關討論
  • 市場佔有率
  • 市場佔有率分析

第10章 覆蓋部門分析

  • 主要調查結果
  • 市場工程評估
  • 收益預測
  • 收益預測相關討論
  • 市場佔有率
  • 市場佔有率分析

第11章 亞太地區市場分析

  • 主要調查結果
  • 收益預測
  • 收益預測相關討論

第12章 北美市場分析

  • 主要調查結果
  • 收益預測
  • 收益預測相關討論

第13章 歐洲、中東、非洲市場分析

  • 主要調查結果
  • 收益預測
  • 收益預測相關討論

第14章 總論

  • 總論:三大預測
  • 免責聲明

第15章 附錄

目錄
Product Code: MD11-30

IoT and Smaller Device Nodes Provide Promising Growth, while EUV and Other Technology Limitations Take a Toll on the Market

The lithography metrology equipment market is riding on the high wave of the semiconductor industry. The 2x and 1x nodes of memory and logic devices, coupled with the sensor and connected devices required to support the growth in IoT, self-driving cars, and Ars are among the key drivers which will drive the lithography metrology market. Worth $957.9 million in 2016, the market is expected reach revenue of $ 1370.1 million by 2021 at a CAGR of 7.4% although each product segment will vary in growth rate. The overlay and OCD segment will witness high growth driven primarily by the technical capability to measure at required specification and high throughput for the sub-28 nm nodes.

Research Scope

The study focuses on both dimensional and placement metrology systems used for the process control in patterning the wafers and reticles in semiconductor fabs and mask shops, particularly after mask and etch processes of the process flow. The metrology systems covered in the study includes:

  • CD-SEM
  • OCD
  • Overlay

The market size of each product segment is provided for 2016 and forecasted up to 2021. The competitive landscape of each segment and the market share of key competitors such as Hitachi High-Technologies, KLA-Tencor, and ASML are also provided along with their strategic approach towards the market. The market participants are working towards enhancing the current capabilities to stay valid with device miniaturization and growing complexity of the architecture. A comparison of the current technological capability of each product is also provided. Furthermore, an insight into new technologies being developed to meet the future needs of the industry is also provided.

The study highlights and analyzes the factors that will enable market growth and the challenges that the industry will face during 2017 to 2021. In addition, the study covers a geographical analysis of the market with revenue in 2016 and an analysis of forecasted growth until 2021.

Key Questions this Study will Answer

  • Which product segment will grow the fastest in the next 5 years and what is the market size in terms of revenue for each of the segments?
  • What impact will IoT and industry inflection will have on the market?
  • What are the key market and technology trends?
  • What are the competitive landscape and dynamics influencing the growth and development of the market?
  • Will the current technological capability of the products meet the requirement of future devices, given that the form factor evolves drastically in the sub-10 nm node?

Table of Contents

1. EXECUTIVE SUMMARY

  • Key Findings
  • Market Engineering Measurements
  • Market Engineering Measurements (continued)
  • CEO's Perspective (Conclusion and Implication)

2. MARKET OVERVIEW

  • Research Scope
  • Market Definition
  • Market Definition (continued)
  • Market Definition (continued)
  • Definition and Segmentation
  • Key Questions this Study will Answer
  • Research Aims and Objective
  • Research Methodology
  • Market Segmentation
  • Market Distribution Channel
  • Industry Inflection
  • Industry Inflection (continued)

3. MARKET DRIVERS AND RESTRAINTS-LITHOGRAPHY METROLOGY EQUIPMENT MARKET

  • Market Drivers
  • Drivers Explained
  • Drivers Explained (continued)
  • Drivers Explained (continued)
  • Drivers Explained (continued)
  • Drivers Explained (continued)
  • Drivers Explained (continued)
  • Drivers Explained (continued)
  • Drivers Explained (continued)
  • Market Restraints
  • Restraints Explained
  • Restraints Explained (continued)

4. REVENUE FORECAST-LITHOGRAPHY METROLOGY EQUIPMENT MARKET

  • Market Engineering Measurements
  • Market Engineering Measurements (continued)
  • Forecast Assumptions
  • Revenue Forecast
  • Revenue Forecast Discussion
  • Revenue Forecast Discussion (continued)
  • Percent Revenue Forecast by Region
  • Revenue Forecast by Region
  • Regional Hot Spots
  • Regional Hot Spot Discussion
  • Regional Hot Spot Discussion (continued)
  • Revenue Forecast Discussion by Region

5. MARKET SHARE AND COMPETITIVE ANALYSIS-LITHOGRAPHY METROLOGY EQUIPMENT MARKET

  • Market Share
  • Market Share Analysis
  • Competitive Environment
  • Competitive Environment (continued)
  • Top Competitors-SWOT Analysis
  • Competitor Profile-Hitachi High-Technologies Corporation
  • Competitor Profile-KLA-Tencor
  • Competitor Profile-ASML
  • Competitive Factors and Assessment
  • Competitive Factors and Assessment (continued)

6. GROWTH OPPORTUNITIES AND COMPANIES TO ACTION

  • 3 Major Growth Opportunities for Lithography Metrology Equipment Market
  • Growth Opportunity-Internet of Things
  • Growth Opportunity-Device Advancements
  • Growth Opportunity-Advanced Process Control
  • Strategic Imperatives for Success and Growth

7. TECHNOLOGY TRENDS

  • Edge Placement Error-A Trending Equipment
  • CD-AFM Market
  • Technology Comparison
  • Hybrid Metrology-Overview
  • Frost Perspective-Rental Equipment Business Model
  • Frost Perspective-Rental Equipment Business Model (continued)

8. CD-SEM SEGMENT ANALYSIS

  • Key Findings
  • Market Engineering Measurements
  • Revenue Forecast
  • Revenue Forecast Discussion
  • Revenue Forecast Discussion (continued)
  • Market Share
  • Market Share Analysis

9. OCD SEGMENT ANALYSIS

  • Key Findings
  • Market Engineering Measurements
  • Revenue Forecast
  • Revenue Forecast Discussion
  • Market Share
  • Market Share Analysis

10. OVERLAY SEGMENT ANALYSIS

  • Key Findings
  • Market Engineering Measurements
  • Revenue Forecast
  • Revenue Forecast Discussion
  • Market Share
  • Market Share Analysis

11. APAC ANALYSIS

  • Key Findings
  • Revenue Forecast
  • Revenue Forecast Discussion
  • Revenue Forecast Discussion (continued)

12. NA ANALYSIS

  • Key Findings
  • Revenue Forecast
  • Revenue Forecast Discussion

13. EMEA ANALYSIS

  • Key Findings
  • Revenue Forecast
  • Revenue Forecast Discussion

14. CONCLUSION

  • The Last Word-Three Big Predictions
  • Legal Disclaimer

15. APPENDIX

  • Market Engineering Methodology
  • Additional Sources of Information
  • List of Companies in the Lithography Metrology Equipment Market
  • Partial List of Companies Interviewed
  • Learn More-Next Steps
  • Abbreviations and Acronyms Used
  • Abbreviations and Acronyms Used (continued)
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