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市場調查報告書

薄膜非晶矽太陽電池相關主要專利分析

Thin Film a-Si Solar Cell Key Patent Analysis

出版商 DisplayBank
出版日期 2009年02月 商品編碼 95292
內容資訊 英文  
價格
本報告書已不再販售

本報告已在2011年09月05日停止出版。

簡介

全球PV(太陽光發電)的熱潮促使薄膜a-Si太陽電池產業在過去2∼3年內創下超過30%的大幅成長,未來更可望繼續成長。但原料p-Si(多孔質矽)不足及能源轉換效率低落成為擴大銷售的阻礙,目前PV的設備成本是其他可再生能源的3∼4倍、化石燃料的6∼10倍。可能解決該問題的是能將矽用量降至最少的利用薄膜a-Si、CdTe、CIS/CIGS、彈性薄膜技術的太陽電池,其生產活動主要由日本、台灣、歐洲負責。

本報告書內容包括:薄膜非晶矽太陽電池技術之主要專利申請製造商別分類、電路板、穿透電極、金屬電極、吸收層、中間層、構造、雷射劃線、模組等各技術的專利動向分析。內容綱要摘記如下:

第1章 薄膜非晶矽太陽電池技術

  • 薄膜非晶矽太陽電池的製造工程
  • 同質接合及異質接合太陽電池(單一、串聯、並聯接合型)
  • 彈性太陽電池及捲繞對位技術

第2章 分析標準及範圍

  • 分析標準
  • 最終採用資料的處理方法
  • 技術分類

第3章 專利活動分析

  • 整體專利活動
  • 技術申請動向

第4章 企業別專利申請狀況

  • 三洋電機
  • 富士電機
  • 夏普
  • 日立
  • 佳能
  • 其他技術別申請成績
    • Kaneka
    • Panasonic
    • 產業技術綜合研究所
    • 三井東壓化學
    • 三菱重工

第5章 專利分析指標

  • 概要
  • TCT及SL分析
  • 各國R&D動向
  • 技術別市場性分析
  • 申請企業別專利競爭力動向

第6章 詳細分析

  • 分析概要
    • 範圍選擇標準
  • 技術別詳細分析
    • 電路板技術的專利介紹
    • 穿透電極
    • 穿透電極技術的專利介紹
    • 金屬電極
    • 金屬電極技術的專利介紹
    • 吸收層
    • 吸收層技術的專利介紹
    • 中間層
    • 中間層技術的專利介紹
    • 構造
    • 構造技術的專利介紹
    • 雷射劃線及模組
    • 雷射劃線技術的專利介紹
    • 雷射模組技術的專利介紹
  • 申請數佔前5大的企業詳細分析
    • 概況
    • 三洋電機
    • 佳能
    • Solarex
    • Amoco Enron Solar
    • 富士電機
  • 主要企業的詳細分析(模組、設備)
    • 主要模組製造商的專利申請狀況
    • 夏普
    • Kaneka
    • 三菱重工
    • 富士電機系統
    • 三洋電機
  • 主要設備製造商的專利申請狀況
    • Applied Materials
  • 其他企業

第7章 結論

  • 技術開發動向
  • 技術開發展望

目錄

Abstract

The PV industry has shown more than 30% annual growth rate in the past two to three years due to the global PV industry boom and shows a promising future. However, it appears to have difficulties in rapid distributions due to insufficient p-Si, a raw material, volume and low solar cell conversion efficiency. The PV unit cost is 3 to 4 times more expensive than other renewable energies and 6 to 10 times more expensive than fossil fuels.

In order to resolve such issues, solar cell makers focus in next-generation solar cells such as thin film a-Si solar cells which minimize Si materials, CdTe based solar cells, CIS/CIGS based solar cells, and flexible thin film solar cells to cut the cell manufacturing cost. Of this, the thin film a-Si solar cell technology is recognized as a research field to manufacture inexpensive high efficiency solar cells to innovatively enhance the PV economic efficiency by replacing expensive crystalline silicon solar cell. Recently, there have been large-scale investments made in this field. It is being produced in countries focused in Japan, Taiwan, and Europe.

Displaybank published "Thin Film a-Si Solar Cell Technology" regarding such thin film a-Si solar cell technology. It analyzed the technology targeting released and registered WIPS DB patents in Korea, Japan, Europe, and U.S. from 1977 to October 31, 2008 along with INPADOC and G-PAT patent database.

This report categorized the thin film a-Si solar cell technology basically by major maker and applicant. The technology was divided into -RaSubstrate, -RaTransparent Electrode, -RaMetal Electrode, -RaAbsorption Layer, -RaInterlayer, -RaStructure, -RaLaser Scribing, -RaModule technology. Specially, this report analyzed the key patent of thin film a-Si solar cell manufacturing technology applied by major makers by yearly flow chart that it allowed readers to understand major technologies' development trend and patent rights at one glance.

Table of Contents

1. Thin Film a-Si Solar Cell Technology

  • 1.1. Thin Film ¥a-Si Solar Cell Manufacturing Process
  • 1.2. Homogeneous Junction & Heterogeneous Junction Solar Cell (Single, Tandem, Triple junction)
  • 1.3. Flexible Solar Cell & Roll to Roll Technology

2. Analysis Criteria and Analysis Scope

  • 2.1. Analysis Criteria
  • 2.2. Final Valid Data Status
  • 2.3. Technical Classification

3. Patent Activity Analysis

  • 3.1. Overall Patent Activities
  • 3.2. Application Trends of Technology

4. Patent Activities by Assignee

  • 4.1. Applications in Sanyo Electric
  • 4.2. Applications in Fuji Electric
  • 4.3. Applications in Sharp
  • 4.4. Applications in Hitachi
  • 4.5. Applications in Canon
  • 4.6. Others
    • 4.6.1. Kaneka' s Applications by Technology
    • 4.6.2. Matsushita Electrics Applications by Technology
    • 4.6.3. Agency of Industry Science & Technols Applications by Technology
    • 4.6.4. Mitsui Toatsu Chemicals Applications by Technology
    • 4.6.5. Mitsubishi Heavys Applications by Technology

5. Patent Analysis Index

  • 5.1. Overview
  • 5.2. TCT & SL Analysis
  • 5.3. R&D Trends by Country
  • 5.4. Marketability Analysis by Technology
  • 5.5. Patent Competitiveness Trends by Assignee

6. In-Depth Analysis

  • 6.1. Analysis Outline
    • 6.1.1. Selection Criterion and Scope
  • 6.2. In-depth Analysis by Technology
    • 6.2.1. Patent Summary of Substrate Technology
    • 6.2.2. Transparent Electrode
    • 6.2.3. Patent Summary of Transparent Electrode Technology
    • 6.2.4. Metal Electrode
    • 6.2.5. Patent Summary of Metal Electrode Technology
    • 6.2.6. Absorption Layer
    • 6.2.7. Patent Summary of Absorption Layer Technology
    • 6.2.8. Interlayer
    • 6.2.9. Patent Summary of Interlayer Technology
    • 6.2.10. Structure
    • 6.2.11. Patent Summary of Structure Technology
    • 6.2.12. Laser Scribing and Module
    • 6.2.13. Patent Summary of Laser Scribing Technology
    • 6.2.14. Patent Summary of Module Technology
  • 6.3. In-depth Analysis of Top5 Assignee
    • 6.3.1. Overview
    • 6.3.2. Sanyo Electric
    • 6.3.3. Canon
    • 6.3.4. Solarex
    • 6.3.5. Amoco Enron Solar
    • 6.3.6. Fuji Electric
  • 6.4. In-depth Analysis of Major Companies (Modules, Equipment)
    • 6.4.1. Patent Status of Major Module Companies
    • 6.4.2. Sharp
    • 6.4.3. Kaneka
    • 6.4.4. Mitsubishi Heavy Industries
    • 6.4.5. Fuji Electric Systems
    • 6.4.6. Sanyo Electric
  • 6.5. Patent Status of Major Equipment Companies
    • 6.5.1. Applied Materials
  • 6.6. Others

7. Conclusion

  • 7.1. Trend of Technology Development
  • 7.2. Technology Development Prospects
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