Abstract
The worldwide photomask market is estimated to be $2.98 billion in 2007 and forecasted to reach $3.89 billion in 2010. Growth is being driven by advanced technology feature sizes (less than 90-nm). The massive wave of consolidation appears to have stabilized, although one merchant mask shop was acquired in 2007.
SEMI has conducted a supply-side market characterization of the photomask market. Seven regions of the world are covered in this summary including North America, Japan, Europe, Taiwan, Korea, China, and Rest of World. Market size estimates reflect the merchant and captive market, and excludes license, royalty, and equipment revenues. In addition to the interviews, a comprehensive literature review, including company financial reports, was conducted.
Methodology and Scope
Two methodologies were used in the development of this information. First, major suppliers were interviewed and contacted for the purpose of this analysis. A questionnaire, which summarizes all of the desired information, was developed and sent to all of the suppliers. Of the companies contacted, 3 responded directly to the survey questionnaire.
Table of Contents
- Methodology and Scope
- Background
- Technology Trends
- Beyond 45-nm
- Market Trends
- Market and Market Outlook
- Summary
Appendices
- Photomask and Reticle questionnaire
- Summary of Merchant Photomask Supplier Websites
- Figure 1 - 2007 Wafer Fabrication Materials Market
- Figure 2 - Consolidation in the Photomask Industry Since 1986
- Figure 3 - Market share Trends in the Photomask Industry
- Figure 4 - Wafer Fab Capacity by Feature Size
- Figure 5 - Key Lithography-related Characteristics by Product
- Figure 6 - Photomask Market Forecast (millions of U.S. dollars)
- Table 1 - List of Photomask Suppliers Contacted for the Photomask Characterization
- Table 2 - 45 nm Lithography Technology Adoption and Timing
- Table 3 - Summary of Photomask Suppliers Strategic Relationships
- Table 4 - Regional Photomask Market 2003-2010
